3.2 TIARA? --- Frontiers of Materials Science and Biotechnology with the Aid of Ion Beams

 

This picture, 231KB

Fig. 3-5
TIARA (Takasaki Ion Accelerators for Advanced Radiation Applications)

 

Table 3-1

Accelerator Some performances Remarks
Accelerated
particle
Energy
(MeV)
Current
(micro-A)
AVF Cyclotron
H
Kr
5 ~ 90
210 ~ 520
30
0.1
Wide uniform irradiation; Availability of neutrons
3 MV Tandem
accelerator
C
Au
0.8 ~ 15
3 ~ 18
10
15
Use of microbeam
and multiple beams
3MVSingle-ended
accelerator
H
He
0.4 ~ 3
0.4
100
70
Same as above
400 keV Ion
implanter
B
P
0.01 ~ 0.4
0.01 ~ 0.4
30
30
Combined use with other accelerators

 


Four kinds of ion beam generators are included in TIARA (Takasaki Ion Accelerators for Advanced Radiation Applications): An ion cyclotron and a tandem accelerator installed in 1991, a single-ended accelerator and an ion implanter completed in 1993. All these have come into full use for the study of advanced radiation applications using ion beams.
Radiation applications using gamma-rays and electron beams are now widespread in industry. With ion beams, we can produce a number of regions in irradiated matter where ionizations and excitations occur in extremely high concentrations, which could never be attained with gamma-rays or electron beams.
The use of ion beams also permits us to introduce various elements in irradiated matter, irrespective of its composition. Advanced research for the application of ion beams to the study of new materials to be used in space and in fusion reactors and for the creation of new functional materials are envisaged. Through cooperation with many research institutions world-wide, we aim at a new expansion of R&D in various fields of science and technology.
TIARA can accelerate almost all elements to energies in the range from keV up to hundreds of MeV (see Table). An AVF cyclotron equipped with various types of ion sources and a tandem electrostatic accelerator serve this purpose. Two other electrostatic accelerators, a 3 MV single-ended accelerator and a low energy one for ion implantation use, combined with the preceding ones, facilitate the study of the effects of multiple-beam irradiations and the analysis during irradiation.


Reference

JAERI TIARA Annual Report 1993 (Vol. 3).

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Persistent Quest-Research Activities 1995
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